Carl Zeiss will be exhibiting a range of high performance optical and electron microscopy products in Booth #725 at the PITTCON 2013 Conference and Expo from March 18-21, 2013 in Philadelphia.
Included in the display will be Carl Zeiss’ unique software for correlative microscopy in materials analysis, which is invaluable for transforming electron beam lithography workflow by bridging the electron and florescent light microscopy systems together.
Enabling users to recall regions of interest in fixed specimens in an electron microscope that were previously identified in a light microscope and vice versa, the ‘Shuttle & Find’ interface allows for precise and rapid overlay of light and electron microscope images, high-resolution magnification of details, and the merger of functional and structural information.
Users can also analyze thousands to millions of cubic micrometers of volume in all three dimensions at nanometer scale resolution.
Carl Zeiss’ correlative microscopy solution, with their innovative ‘Shuttle & Find’ program, is an integrated hardware and software solution that will enable new insights into the micro and nano worlds.
Facilitating a quicker Electron beam lithography workflow, the new system reduces cycle times as well as provides high quality image processing, analysis, and documentation.