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IPG Photonics Expands Laser Diode Production with a Veeco GEN2000 MBE System

Published: Wednesday, January 09, 2013
Last Updated: Tuesday, January 08, 2013
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Delivers exceptional wafer quality in high-capacity production applications.

Veeco Instruments Inc. has announced that it has recently completed installation of a GEN2000® Edge™ Molecular Beam Epitaxy (MBE) System at IPG Photonics Corporation.

The system was delivered to further expand their production of high-quality GaAs-based lasers. This order follows IPG’s prior purchases of three Veeco GEN200® Systems.

Dr. Alex Ovtchinnikov, Vice President-Components for IPG, stated, “We have been very pleased with the cost of ownership advantages and the unsurpassed performance of our previously purchased GEN200 Systems. Thus, it made sense to scale-up to a higher capacity GEN2000 System to accommodate our needs for increased throughput today. Veeco is a valued IPG partner, offering us timely delivery, professional installation, and unmatched service and support.”

“Repeat orders such as this from IPG attest to the leading performance of Veeco’s cluster-based systems for production applications, as well as the continuing, comprehensive support Veeco offers,” said Jim Northup, Vice President and General Manager of Veeco's MBE Operations.

He added, “We are pleased to continue to support IPG in their capacity expansion.”

The GEN2000 Edge MBE System delivers exceptional wafer quality in high-capacity production applications. Its cluster tool design provides the industry’s most cost effective 7x6” epiwafer growth of devices such as pump lasers, vertical cavity surface-emitting lasers (VCSELs) and heterojunction bipolar transistors (HBTs).

Its cluster tool architecture minimizes clean-room space and downtime attributed to maintenance, increased throughput; and allows for growth of different materials in connected modules.

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