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Swiss R&D Facility EPFL Orders Veeco Ion Beam Etch System

Published: Tuesday, May 21, 2013
Last Updated: Tuesday, May 21, 2013
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NEXUS® IBE system used for research and development projects in micro- and nano-fabrication.

Veeco Instruments Inc. has announced that École Polytechnique Fédérale de Lausanne (EPFL), one of Europe’s top technical universities, has ordered a NEXUS® Ion Beam Etch (IBE) System.

The system will be used for research and development projects in micro- and nano-fabrication at its Lausanne, Switzerland site.

Veeco’s IBE systems are used to etch precise, complex features for high-yield production of discrete microelectronic devices and components.

Dr. Philippe Flückiger, EPFL’s Director of Operations commented, “Veeco has been well known as the top supplier of IBE technology for decades, so it was the clear choice for us. Ion Beam Etch is important in our micro- and nano-fabrication because we need the ability to accurately etch difficult to etch materials and multi-layer stacks used in today’s emerging applications. Veeco’s technology also provides us a level of precision in defining our structures not available with other dry etching techniques.”

Vivek Vohra, Veeco’s Vice President and General Manager, commented, “Given the growing trend of thin film based sensors being used in various consumer applications, we are very excited that our IBE technology has been selected by a new customer - EPFL - which is a top European research institution. We look forward to supporting their innovative research and industry collaborations.”

Veeco’s IBE and other technologies are used globally by leading customers for etching/depositing various thin films to produce micro electro mechanical systems (MEMS) and magnetic sensors.


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