P-541/P-542 nanopositioning and scanning stages are designed for easy integration into high-resolution micro-scopes. They feature a very low profile of 16.5 mm, a large 80 x 80 mm aperture, and offer highly accurate motion with sub-nanometer resolution.
Choice of Drives: Long Range or High-Speed Direct Drive
A variety of models are offered to suit a large range of applications: lever-amplified XY systems with 100 and 200 µm travel and direct-driven XY scanners with 45 µm travel. Their high resonant frequencies of 1.5 kHz in both axes allow for faster step response and higher scanning rates, needed for example in single-molecule microscopy, or in other time-critical applications. Z stages and Z-tip/tilt stages are also available.
Higher Precision Through Parallel Kinematics/- Metrology with Capacitive Feedback Sensors
P-541/P-542 XY piezo scanning stages feature a single-module, parallel-kinematics design with all actuators operating on one central platform and no moving cables to cause microfriction. Advantages over serial kinematics setups are a lower profile, reduced inertia and better, axis-independent dynamics.
Capacitive sensors measure the actual distance between the fixed frame and the moving part of the stage directly and include any flex or other errors in the drive train—from the actuator through the lever and flexures to the platform—in the measurement. This results in higher motion linearity, long-term stability, phase fidelity, and—because external disturbances are seen by the sensor immediately—a stiffer, faster-responding servo-loop. See p. see link ff. and p. see link ff. for more information.
With parallel direct metrology, all capacitive sensors measure the position of the same moving platform against the same stationary reference (the fixed frame). This means that all motion is inside the servo-loop, no matter which actuator may have caused it, resulting in superior multi-axis precision. Advantages include: higher resolution in non-diffraction-limited imaging techniques (NSOM, etc.) and reduced blurring of edges in high-speed microscopy applications.