Vacuum Process Gas Analyzer
Product News Jan 23, 2014
The compact Hiden HPR-30 differentially-pumped mass spectrometer enables real-time measurement and control of gas composition in vacuum processes in the pressure regime 1mbar to 10E-4mbar, addressing multiple process areas including vacuum coating, plasma etching, sputter deposition, CVD/MOCVD and RIE.
The system mounts directly to the process chamber with the close-coupled re-entrant sample extractor tube inserted directly into the process environment for fastest response to status changes in the gas composition, the integral differential turbo-molecular pump ensuring the mass spectrometer(MS) continues to operate within a UHV environment through process pressures up to 1mbar.
Alternatively the HPR-30 can be cart-mounted with remote process system coupling for qualitative gas analysis and for leak detection.
The system is fully PC controlled and programmable for automatic operation and data reporting. Multiple input channels enable process data such as process pressure, temperature, feed-gas admission/shutoff status for example to be fully integrated with the acquired mass spectra.