We've updated our Privacy Policy to make it clearer how we use your personal data.

We use cookies to provide you with a better experience. You can read our Cookie Policy here.

Advertisement
Veeco Introduces new InSight 3D Atomic Force Microscope
Product News

Veeco Introduces new InSight 3D Atomic Force Microscope

Veeco Introduces new InSight 3D Atomic Force Microscope
Product News

Veeco Introduces new InSight 3D Atomic Force Microscope


Want a FREE PDF version of This Product News?

Complete the form below and we will email you a PDF version of "Veeco Introduces new InSight 3D Atomic Force Microscope"

First Name*
Last Name*
Email Address*
Country*
Company Type*
Job Function*
Would you like to receive further email communication from Technology Networks?

Technology Networks Ltd. needs the contact information you provide to us to contact you about our products and services. You may unsubscribe from these communications at any time. For information on how to unsubscribe, as well as our privacy practices and commitment to protecting your privacy, check out our Privacy Policy

Veeco Instruments Inc., has announced the introduction of its new InSight™ 3D Automated Atomic Force Microscope (AFM) Platform, the only metrology system available with the accuracy required for non-destructive, high resolution three-dimensional (3D) measurements of critical 45nm and 32nm semiconductor features, with the speed to qualify as a true fab tool.

Veeco's InSight 3DAFM was designed specifically to address Critical Dimension (CD), depth and chemical mechanical planarization (CMP) metrology in a production environment.

John R. Peeler, Chief Executive Officer of Veeco, commented, "With three times the throughput (30 wafers per hour) and two times the measurement accuracy and precision of our previous AFMs, Veeco's InSight represents an entirely new approach for semiconductor 3D metrology. It is the only tool on the market today providing in-line, accurate, non-destructive 3D information, to drive shorter process development and manufacturing ramp times, improve our customers' cost of ownership and decrease their manufacturing risk."

"At 45nm and below, current in-line metrology techniques are limited in their ability to measure CD," added Paul Clayton, Vice President, Veeco's Auto AFM Business Unit.

"Technologies such as CD-SEM and scatterometry are precise, but not accurate enough, causing significant measurement issues. Veeco's InSight provides the lowest measurement uncertainty for CD metrology, which leads to improved process control."

Advertisement