We've updated our Privacy Policy to make it clearer how we use your personal data.

We use cookies to provide you with a better experience. You can read our Cookie Policy here.

Veeco Wins Innovation Award with EPIK700 MOCVD System

Veeco Wins Innovation Award with EPIK700 MOCVD System

Veeco Wins Innovation Award with EPIK700 MOCVD System

Veeco Wins Innovation Award with EPIK700 MOCVD System

Read time:

Want a FREE PDF version of This News Story?

Complete the form below and we will email you a PDF version of "Veeco Wins Innovation Award with EPIK700 MOCVD System"

First Name*
Last Name*
Email Address*
Company Type*
Job Function*
Would you like to receive further email communication from Technology Networks?

Technology Networks Ltd. needs the contact information you provide to us to contact you about our products and services. You may unsubscribe from these communications at any time. For information on how to unsubscribe, as well as our privacy practices and commitment to protecting your privacy, check out our Privacy Policy

Veeco Instruments Inc. has announced that its TurboDisc® EPIK700™ Gallium Nitride (GaN) Metal Organic Chemical Vapor Deposition (MOCVD) System won the Compound Semiconductor (CS) Industry Innovation Award for the highest distinction in compound semiconductor manufacturing over the last 12 months.

The CS Industry Innovation Award, which is based on an industry-wide nominating and voting process, recognizes success and development along the entire value chain of the compound semiconductor industry from research to completed device, focusing on the people, processes and products that drive the industry forward.

“We are honored to receive the CS Manufacturing Award for Innovation for the EPIK700 MOCVD system, particularly since the award was determined by a vote of our peers, LED customers and industry,” said Jim Jenson, Senior Vice President, Veeco MOCVD. “The EPIK700 MOCVD system has the highest performance in the industry, reducing per wafer cost by up to 20 percent, and will play a significant role in the growing adoption of solid state lighting.”

The Innovation Award was awarded for the most innovative outcome from compound semiconductor manufacturing and highlights products and processes that demonstrate the most innovative approaches for pushing the technical barriers during the last year. In mid-March, the 2015 award was presented to Veeco’s Sudhakar Raman, Vice President of Marketing, MOCVD at the CS International Conference in Frankfurt, Germany.

"Making LEDs with good margins is tough in the current environment,” said Richard Stevenson, editor of Compound Semiconductor Magazine. “Increasing yield and productivity holds the key, making the latest multi-wafer tool from Veeco an attractive option."

This is the third time in four years that Veeco has won a major CS Industry Award. The TurboDisc® MaxBright® Multi-Reactor Metal Organic Chemical Vapor Deposition (MOCVD) System was awarded the Compound Semiconductor Manufacturing Award in 2012 for the best innovative technology in compound semiconductor equipment.

The GENxplor™ R&D Molecular Beam Epitaxy (MBE) System won the Compound Semiconductor (CS) Industry Award for the biggest breakthrough in compound semiconductor manufacturing in 2014.