XEI is Invited to Present a Paper at AVS 62nd International Symposium & Exhibition

XEI Scientific Inc. Founder and President, Ronald Vane, has been invited to present a paper in the Methodology for Improving Vacuum Performance session at the American Vacuum Society's 62nd annual International Symposium to be held in San Jose, October 18-23.

The founder and President of XEI, Ronald Vane, will present the invited paper Plasma Cleaning of Scanning Electron Microscopes (SEMs) and Large Vacuum Systems at the 62nd AVS International Symposium and Exhibition on October 21, 2015 in San Jose, CA. This paper will discuss the development of plasma cleaning for vacuum instruments and the recent extension of this cleaning technology into high vacuum.

The presentation will take place in the Methodology for Improving Vacuum Performance session at 2:20 pm at the AVS International Symposium and Exhibition, October 18th - 23rd at the San Jose Convention Center in San Jose, California.

The AVS 62nd Symposium and Exhibition addresses cutting edge issues associated with materials, processing and interfaces in both the research and manufacturing communities. The weeklong Symposium fosters a multidisciplinary environment that cuts across traditional boundaries between disciplines, featuring papers from AVS Technical Division, Groups, Focus Topics on emerging technologies and more.

An extensive Exhibition of related equipment, tools, materials, supplies, chemicals, services, consulting, technical literature, and new technologies are showcased during the week.

XEI will be showing a new generation of Evactron systems with turbo plasma cleaning that give “The Fastest Way to Pristine™” at booth #924 at the exhibition. A live demo of the Evactron EP plasma cleaner will be featured demonstrating easy chamber plasma cleaning during continuous turbo molecular pump operation.

Also demonstrated will be remote Bluetooth control of the plasma from a tablet device. Visit the booth and find out about their newest models of turbo plasma cleaning devices, such as the Evactron Zephyr models and Model ES and EP, which offer faster cleaning at TMP pressures.