Intelligent Micro Patterning Provides SF-100 Auto Stage System to Sheffield University
News Mar 03, 2006
Intelligent Micro Patterning, LLC, St. Petersburg, Florida, has announced the sale of an SF-100 Auto Stage system to the Department of Electronic and Electrical Engineering at the University of Sheffield, United Kingdom.
The SF-100 is a maskless photolithography system that utilizes patented Smart Filter technology, licensed by Intelligent Micro Patterning, LLC from the University of South Florida.
Smart Filter technology incorporates micro-optical techniques to rapidly project master images directly onto diverse substrate materials, such as quartz, ceramics, and plastics, without the use of photomasks.
Additionally, the SF-100 Auto Stage system provides automated substrate handling for automated printing of large area devices.
The system has been funded by the Engineering and Physical Sciences Research Council and the main application will be the development of three dimensional microfabrication processes in collaboration with Professor Alan Purvis at Durham University.
Dr. Jay Sasserath, the Company’s Chief Executive Officer, stated, "Working with these prestigious universities is a real opportunity for Intelligent Micro Patterning."
"Sheffield and Durham researchers have proven themselves to be leaders in many fields over the years and having the SF-100 available as an integral part of their research will benefit all of our organizations."
"Intelligent Micro Patterning has already established ourselves as the leaders in doing non-standard three dimensional lithography. Through the work with Sheffield and Durham, we expect to expand upon this strong base and further validate our expertise in this high growth markt segment."
Dr. Luke Seed, University of Sheffield, added, "This system will provide unique research opportunities for our group. Intelligent Micro Patterning was very flexible in working with us and allowed us to customize the system for our specific requirements."
"This will allow us the flexibility and capabilities needed to more effectively perform our research. Additionally, the unique design of the SF-100 offered many benefits over more traditional lithography systems, allowing us to expand our lithography capabilities with the implementation of this system."