Mettler Toledo Announces New PAT Technique
Product News Apr 15, 2015
Mettler Toledo has announced that the Relative Backscatter Index (RBI) technique is now available. Developed by Mettler Toledo for scientists developing and manufacturing particles, crystals and droplets, RBI is a new PAT technique that shows how particle size, shape and concentration change in real-time.
Unlike turbidity measurements which lack sensitivity and can be difficult to interpret, RBI is an image-based measurement that utilizes real-time microscopy to accurately determine particle system reflectivity in-process.
RBI is used to study changes in particle size, shape and concentration. Automatically combined with high resolution real-time microscopy images, RBI provides a simple, yet informative, process measurement that can be used to understand, optimize and control complex particle systems.
RBI is available to users of Mettler Toledo ParticleView 19 with PVM technology. Combined with real-time microscopy, RBI is an innovation in real-time measurement that combines simplicity with information-rich understanding to provide an easy-to-use technique supporting the development of quality processes in less time at lower costs.
Common RBI applications include solubility and metastable zone width determination (MZWD) for crystallization development; comparing crystallization rate under different process conditions; identifying the endpoint and equilibrium state for particle processes; characterizing process events such as secondary nucleation, droplet coalescence or particle breakage.