Rigaku Announces the NANOPIX, its Latest Small Angle and Wide Angle X-ray Scattering (SAXS/WAXS) Measurement System
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Rigaku Corporation has announced the launch of the NANOPIX SAXS/WAXS measurement system, a new X-ray scattering instrument designed for nanostructure analyses. The NANOPIX SAXS/WAXS measurement system can be used for both small angle scattering (SAXS) and wide angle scattering (WAXS) measurements, which makes it possible to evaluate multiscale structures from sub-nanometer to nano-order (0.1 nm to 100 nm). The NANOXPIX SAXS/WAXS measurement system achieves the highest level of small angle resolution (Qmin to 0.02 nm-1) for a laboratory SAXS instrument.
Small angle X-ray scattering (SAXS) is a technique used to study nanoscale structures of atoms or molecules and their variation by measuring the diffuse scattering from unequal electron density areas. SAXS experiments are performed in a wide range of fields from R&D to quality control.
The NANOPIX SAXS/WAXS measurement system is applicable to the study of a variety of materials including solids, liquids, liquid-crystals, or gels with ordered and disordered structures, and diverse applications including nanoparticle size distribution analyses, three-dimensional protein molecule structure analyses, identification of molecular assembly or disassembly and research of advanced materials, such as carbon fiber-reinforced plastics (CFRP).
The NANOPIX SAXS/WAXS measurement system is configured with a high-brilliance, high-power point focus X-ray source, the OptiSAXS high-performance multilayer mirror, the ClearPinhole high-performance, low scattering pinhole slits, and the HyPix-3000 high-performance 2D semiconductor detector that enables the detection of diffraction and scattering even from anisotropic materials. Optionally, the HyPix-6000 detector is also available for wide angle measurements, offering an expanded detection area by combining two detection modules.
As one of the key features, the sample-to-detector distance is changeable depending on the structure size ranging from atomic structure (microstructures: 0.2 - 1 nm) to molecular structure (macrostructures: 1 - 100 nm).
In addition, the NANOPIX SAXS/WAXS measurement system enables measurements under various temperature or humidity conditions, experiments with simultaneous DSC (differential scanning calorimetry) measurements, as well as measurements in combination with special attachments or other external devices. Control of the measurement environment is essential for the research of structure-property relationships of functional materials.
