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Veeco Launches K475i As/P MOCVD System
Product News

Veeco Launches K475i As/P MOCVD System

Veeco Launches K475i As/P MOCVD System
Product News

Veeco Launches K475i As/P MOCVD System


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Veeco Instruments Inc has announced the launch of the new TurboDisc® K475i™ Arsenic Phosphide (As/P) Metal Organic Chemical Vapor Deposition (MOCVD) System for the production of red, orange, yellow (R/O/Y) light emitting diodes (LEDs), as well as multi-junction III-V solar cells, laser diodes and transistors.


“Veeco continues to drive innovation with MOCVD technology that enables us to lower manufacturing costs and increase production with systems that are reliable, flexible and easy to use,” said Shuangxiang Zhang, General Manager of Yangzhou Changelight Co., Ltd. “The K475i quickly achieved unparalleled yield and brightness that will allow us to meet the growing demand for red, orange and yellow LEDs as well as other As/P based devices.”


According to research firm Strategies Unlimited, R/O/Y LED demand is expected to grow at a 10 percent compound annual rate through 2023. This demand for red, orange and yellow LEDs is being driven by signage, automotive, display and general lighting applications, as well as the emergence of new applications such as wearable smart devices.


Incorporating proprietary TurboDisc and Uniform FlowFlange™ MOCVD technologies, the new K475i system enables Veeco customers to reduce LED cost per wafer by up to 20 percent compared to alternative systems through higher productivity, best-in-class yields and reduced operating expenses.


“The new K475i is built upon production proven technologies that are incorporated into all of our industry-leading MOCVD systems,” said James T. Jenson, Senior Vice President and General Manager, Veeco MOCVD Operations. “We are very pleased with the world-class results reached at Changelight and their rapid qualification of the beta system. We have already seen strong industry interest in the K475i.”


Veeco’s proprietary Uniform FlowFlange technology produces films with very high uniformity and improved within-wafer and wafer-to-wafer repeatability resulting in the industry’s lowest cost of ownership. This patented technology provides ease-of-tuning for fast process optimization and fast tool recovery time after maintenance enabling the highest productivity for applications such as lighting, display, solar, laser diodes, pseudomorphic high electron mobility transistors (pHEMTs) and heterojunction bipolar transistors (HBTs).

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